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Awarded

202122/547 Supply of up to four dry etch and deposition systems

Published

Supplier(s)

Oxford Instruments

Value

2,155,581 GBP

Description

NOTICE OF AWARD OF four dry etch and deposition systems, specifically: •A Deep-Silicon Reactive Ion Etcher (D-RIE) •An Inductively Coupled Plasma-RIE (ICP-RIE) •A parallel plate RIE •A High-Density Plasma-enhanced Chemical Vapour Deposition system (HDP-CVD) Lot 1: NOTICE OF AWARD OF four dry etch and deposition systems, specifically: •A Deep-Silicon Reactive Ion Etcher (D-RIE) •An Inductively Coupled Plasma-RIE (ICP-RIE) •A parallel plate RIE •A High-Density Plasma-enhanced Chemical Vapour Deposition system (HDP-CVD) Additional information: To respond to this opportunity please click here: https://neupc.delta-esourcing.com/respond/ZA5CH77BT9

Timeline

Award date

2 years ago

Publish date

a year ago

Buyer information

University of Leeds

Contact:
Sam Greaves
Email:
s.j.greaves@leeds.ac.uk

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