Published
4420/DM/25 - Dual-growth chamber Molecular Beam Epitaxy System (2 Lots)
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Description
The EPSRC National Epitaxy Facility (NEF) based at the University of Sheffield has been providing bespoke semiconductor wafers to academia and industry for 45 years. It is a unique world-class centre combining technical excellence and expertise with state-of-the-art epitaxy and material characterization equipment. <br /><br />We are looking to further enhance our capability provision to the UK semiconductor community, by investing in a new linked dual-chamber Molecular Beam Epitaxy (MBE) System for arsenides/phosphides and arsenides/antimonides growth that is fully automated, capable of 24/7 operation, reliable, and resource-efficient allowing further expansion in the future.<br /><br />The system is replacing two existing VG reactors capable of 4” wafer growth of high-quality arsenides/phosphides and arsenides/antimonides, and should offer higher throughput thanks to automation of growth recipes for 24/7 operation, and integrated solutions allowing maintenance of critical components (such as ion gauges, cells) without breaking chamber vacuum. <br /><br />This tender is divided into 2 Lots:<br />(Suppliers may bid for one or both Lots)<br /><br />Lot 1 - MBE System<br />Lot 2 - In-situ monitoring equipment<br /><br />The closing date & time for returns to this tender is on the 14th March 2025 at 13:00 Hrs (UK time)
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